Wuxi, China

Yanqiang He

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Csmc Technologies Fab1 Co., Ltd., Csmc Technologies Fab2 Co., Ltd.. Active years: 2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yanqiang He. Retrieved from https://idiyas.com/inventor/yanqiang-he

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 11(Granted Patents)


Location History:

  • Wuxi, CN (2016)
  • Jiangsu, CN (2016)

Company Filing History:


Years Active: 2016

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2 patents (USPTO):Explore Patents

Title: **Yanqiang He: Innovator in Power MOS Device Structures**

Introduction

Yanqiang He is a distinguished inventor based in Wuxi, China, with an impressive portfolio of two patents focusing on advancements in semiconductor technology. His contributions primarily revolve around power MOS device structures and methods for manufacturing semiconductor devices.

Latest Patents

Yanqiang He's latest patents involve groundbreaking innovations in power MOS device structures. His first patent outlines various embodiments that include a plurality of Laterally Diffused MOSFETs (LDMOS) and several bonding pads. The design effectively reduces the on-resistance by increasing the number of basic units of LDMOS, which are arranged below the bonding pads. The bonding pads themselves feature a single layer of metal, optimized in thickness and width, ensuring effective electrical connections to the gate, source, drain, and substrate terminals.

Another noteworthy patent discusses a method for manufacturing semiconductor devices that addresses previous issues with LDMOS devices, particularly concerning silicon exposure at the oxide layer's edge. This innovative manufacturing method employs a semiconductor substrate with designated LDMOS and CMOS regions, integrating a sacrificial oxide layer and a masking layer to successfully create an LDMOS drift region. This approach enhances reliability and functionality, particularly in BCD processes.

Career Highlights

Throughout his career, Yanqiang He has made significant strides in the semiconductor industry. He has worked at prominent companies such as CSMC Technologies Fab1 Co., Ltd. and CSMC Technologies Fab2 Co., Ltd., where he honed his expertise in semiconductor technology and production methods. His work has contributed to advancements that have potential applications in various electronics.

Collaborations

Yanqiang He has collaborated with notable professionals in the industry, including Shu Zhang and TseHuang Lo. These collaborations have played a vital role in his innovation journey, fostering an environment of shared knowledge and expertise that enhances the development of cutting-edge technologies.

Conclusion

In summary, Yanqiang He stands out as an accomplished inventor with significant contributions to power MOS devices and semiconductor manufacturing techniques. His patents reflect his commitment to innovation and the continuous improvement of semiconductor technology, showcasing his vital role in the industry. His work not only advances technical knowledge but also serves as an inspiration for future inventors in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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