Location History:
- Gyeonggi-do, KR (2016 - 2018)
- Yongin-si, KR (2019 - 2020)
Company Filing History:
Years Active: 2016-2020
Title: Innovations by Yang-Sik Shin
Introduction
Yang-Sik Shin is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing, holding a total of 11 patents. His work focuses on improving methods and apparatuses for substrate treatment, which are essential in various technological applications.
Latest Patents
Among his latest patents is a "Method for substrate processing using exhaust ports." This innovative method involves stacking substrates on a holder within a lower chamber and utilizing an auxiliary exhaust port for efficient processing. Another notable patent is the "Substrate treatment apparatus," which features a chamber body with a passage for substrate transfer and an inner reaction tube that facilitates the processing of substrates. These inventions demonstrate his commitment to advancing substrate processing technology.
Career Highlights
Yang-Sik Shin has established himself as a key figure in his field through his innovative patents and contributions to substrate processing. His work has not only enhanced the efficiency of substrate treatment but has also paved the way for further advancements in related technologies.
Collaborations
He has collaborated with notable coworkers, including Kyong-Hun Kim and Il-Kwang Yang, who have contributed to his research and development efforts. Their teamwork has been instrumental in driving innovation within their projects.
Conclusion
Yang-Sik Shin's contributions to substrate processing through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in technology and substrate treatment methods.