The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 11, 2017

Filed:

Nov. 16, 2012
Applicant:

Eugene Technology Co., Ltd., Gyeonggi-do, KR;

Inventors:

Il-Kwang Yang, Gyeonggi-do, KR;

Sung-Tae Je, Gyeonggi-do, KR;

Byoung-Gyu Song, Gyeonggi-do, KR;

Yong-Ki Kim, Chungcheongnam-do, KR;

Kyong-Hun Kim, Gyeonggi-do, KR;

Yang-Sik Shin, Gyeonggi-do, KR;

Assignee:

EUGENE TECHNOLOGY CO., LTD., Yongin-si, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); H01L 21/677 (2006.01); C30B 35/00 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67069 (2013.01); C23C 16/4412 (2013.01); C23C 16/4587 (2013.01); C23C 16/45517 (2013.01); C23C 16/45563 (2013.01); C30B 35/00 (2013.01); H01L 21/67017 (2013.01); H01L 21/67109 (2013.01); H01L 21/67757 (2013.01); H01L 21/0262 (2013.01); H01L 21/02532 (2013.01); H01L 21/02661 (2013.01);
Abstract

Provided is a substrate processing apparatus. The substrate processing apparatus in which processes with respect to substrates are performed includes a lower chamber having an opened upper side, the lower chamber including a passage allowing the substrates to pass therethrough in a side thereof, an external reaction tube closing the opened upper side of the lower chamber to provide a process space in which the processes are performed, a substrate holder on which the one ore more substrates are vertically stacked, the substrate holder being movable between a stacking position in which the substrates are stacked within the substrate holder and a process position in which the processes with respect to the substrates are performed, and a gas supply unit disposed inside the external reaction tube to supply a reaction gas into the process space, the gas supply unit forming a flow of the reaction gas having different phase differences in a vertical direction.


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