The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Apr. 03, 2013
Applicant:
Eugene Technology Co., Ltd., Gyeonggi-do, KR;
Inventors:
Il-Kwang Yang, Gyeonggi-do, KR;
Byoung-Gyu Song, Gyeonggi-do, KR;
Kyong-Hun Kim, Gyeonggi-do, KR;
Yong-Ki Kim, Chungcheongnam-do, KR;
Yang-Sik Shin, Gyeonggi-do, KR;
Assignee:
EUGENE TECHNOLOGY CO., LTD., Yongin-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05B 3/68 (2006.01); F27D 19/00 (2006.01); F27D 7/02 (2006.01); F27D 7/06 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/46 (2006.01); C30B 25/10 (2006.01); C30B 33/12 (2006.01); C30B 35/00 (2006.01);
U.S. Cl.
CPC ...
F27D 19/00 (2013.01); C23C 16/46 (2013.01); C30B 25/10 (2013.01); C30B 33/12 (2013.01); C30B 35/00 (2013.01); F27D 7/02 (2013.01); F27D 7/06 (2013.01); H01L 21/67109 (2013.01); H01L 21/68742 (2013.01); F27D 2007/066 (2013.01); F27D 2019/0028 (2013.01);
Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber providing an inner space in which a process with respect to a substrate is performed, a heating plate on which the substrate is placed, the heating plate being fixedly disposed within the chamber, a heater spaced from a lower portion of the heating plate to heat the heating plate, and a lift module lifting the heater.