The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 14, 2017
Filed:
Nov. 23, 2012
Eugene Technology Co., Ltd., Gyeonggi-do, KR;
Il-Kwang Yang, Gyeonggi-do, KR;
Byoung-Gyu Song, Gyeonggi-do, KR;
Yong-Ki Kim, Chungcheongnam-do, KR;
Kyong-Hun Kim, Gyeonggi-do, KR;
Yang-Sik Shin, Gyeonggi-do, KR;
EUGENE TECHNOLOGY CO., LTD., Yongin-si, Gyeonggi-do, KR;
Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a chamber body having an opened upper side, the chamber body providing an inner space in which processes with respect to a substrate are performed, a chamber lid disposed on an upper portion of the chamber body to close the opened upper side of the chamber body, and a showerhead disposed on a lower portion of the chamber lid to supply a reaction gas into the inner space. The showerhead includes a flange contacting the chamber lid, the flange having a passage recessed from a top surface of the flange to allow a refrigerant to flow therein, and a flat plate disposed inside the flange, the flat plate having at least one injection hole for injecting the reaction gas in a thickness direction thereof.