Yang-Shan Tong

Title: Innovations of Yang-Shan Tong

Introduction

Yang-Shan Tong is a prominent inventor based in Taipei, CN. He has made significant contributions to the field of lithography and layout correction, holding a total of 3 patents. His work focuses on enhancing the efficiency and accuracy of semiconductor manufacturing processes.

Latest Patents

One of his latest patents is titled "Method and system for lithography hotspot correction of a post-route layout." This invention discloses methods and devices for correcting lithography hotspots detected in post-routing layouts. The approach involves selecting and adjusting at least one two-dimensional pattern of changeable size or position of the number of hotspots in a local area. This optimization allows for improved simulation values of the aerial image intensity across various local areas.

Another notable patent is the "Automated repair method and system for double patterning conflicts." This method identifies adjacent even and odd cycles in a layout, facilitating the repair of double patterning conflicts. The process includes forming graph constructs of the layout and prioritizing route guidances for break-link and split-node operations. A list of these route guidances is generated and ordered based on their prioritization.

Career Highlights

Yang-Shan Tong is currently employed at Synopsys, Inc., where he continues to innovate in the field of semiconductor design and manufacturing. His expertise in lithography and layout optimization has made him a valuable asset to the company.

Collaborations

He has collaborated with notable coworkers such as Daniel Zhang and Linni Wei, contributing to various projects that enhance the capabilities of semiconductor technologies.

Conclusion

Yang-Shan Tong's contributions to the field of lithography and layout correction are noteworthy. His innovative patents and work at Synopsys, Inc. reflect his commitment to advancing semiconductor manufacturing processes.