The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2011
Filed:
May. 29, 2008
Yang-shan Tong, Chung-ho, TW;
Daniel Zhang, Milpitas, CA (US);
Linni Wei, Mountain View, CA (US);
Alex Miloslavsky, Sunnyvale, CA (US);
Wei-chih Tseng, Fremont, CA (US);
Zongwu Tang, Pleasanton, CA (US);
Yang-Shan Tong, Chung-ho, TW;
Daniel Zhang, Milpitas, CA (US);
Linni Wei, Mountain View, CA (US);
Alex Miloslavsky, Sunnyvale, CA (US);
Wei-Chih Tseng, Fremont, CA (US);
Zongwu Tang, Pleasanton, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.