The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 15, 2014
Filed:
Sep. 26, 2012
Synopsys, Inc., Mountain View, CA (US);
Paul David Friedberg, Sunnyvale, CA (US);
Tong Gao, Cupertino, CA (US);
Weiping Fang, Fremont, CA (US);
Yang-Shan Tong, San Jose, CA (US);
Synopsys, Inc., Mountain View, CA (US);
Abstract
A method of performing double patterning (DPT) conflict repairs is described. In this method, even cycles adjacent to odd cycles in a layout can be identified (also called adjacent even/odd cycles herein). The identifying can include forming graph constructs of the layout. Route guidances for break-link operations and split-node operations can be prioritized for the adjacent even/odd cycles. A list including the route guidances for the break-link operations and the split-node operations can be generated. The list can be ordered based on the prioritizing.