Company Filing History:
Years Active: 2014
Title: Paul David Friedberg: Innovator in Double Patterning Technology
Introduction
Paul David Friedberg is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of semiconductor technology, particularly in double patterning techniques. With a total of 2 patents, Friedberg's work has advanced the efficiency and effectiveness of standard cell placement in integrated circuits.
Latest Patents
Friedberg's latest patents include a "Standard cell placement technique for double patterning technology." This method provides a way to generate legal colorable multiple patterning standard cell placements by accessing a standard cell library that includes color information. For each standard cell, edge labels are assigned based on the colors of nearby objects. A truth table indicating legal spacing between pairs of standard cells based on their edge labels is utilized to place a plurality of standard cells in a design.
Another significant patent is the "Automated repair method and system for double patterning conflicts." This method describes how to identify even cycles adjacent to odd cycles in a layout, which is crucial for performing double patterning conflict repairs. The process includes forming graph constructs of the layout and prioritizing route guidances for break-link and split-node operations based on the identified cycles.
Career Highlights
Friedberg is currently employed at Synopsys, Inc., a leading company in electronic design automation. His work at Synopsys has allowed him to collaborate with other talented professionals in the field, enhancing the development of innovative solutions in semiconductor technology.
Collaborations
Some of his notable coworkers include John Lee and Gary K Yeap. Their collaboration has contributed to the advancement of technologies that address complex challenges in the semiconductor industry.
Conclusion
Paul David Friedberg's contributions to double patterning technology and his innovative patents have made a significant impact in the field of semiconductor design. His work continues to influence the industry and pave the way for future advancements.