Ya-Ting Hu

Title: Innovations by Inventor Ya-Ting Hu

Introduction

Ya-Ting Hu is an innovative inventor based in Kaohsiung City, Taiwan. She has made significant contributions to the field of semiconductor technology. Although she currently holds no granted patents, her work in developing advanced semiconductor devices showcases her expertise and creativity.

Latest Patent Applications

Ya-Ting Hu's latest patent applications include a method for fabricating a semiconductor device. This method involves several steps, such as providing a substrate with medium-voltage (MV) and low-voltage (LV) regions, forming fin-shaped structures on the LV region, and creating an insulating layer between these structures. Additionally, a hard mask is formed on the LV region, followed by a thermal oxidation process to create a gate dielectric layer on the MV region. Notably, a hump is formed on the substrate surface of the MV region after the hard mask is removed. This hump consists of a first hump adjacent to one side of the substrate and a second hump adjacent to the opposite side.

Another application focuses on a semiconductor device that includes a substrate with high voltage and low voltage regions. This device features a first deep trench isolation within the high voltage region, which consists of a deep trench and an insulating layer filling that trench. The design of the trench includes specific sidewalls formed by different planes, showcasing the complexity and innovation in her work.

Conclusion

Ya-Ting Hu's contributions to semiconductor technology reflect her dedication to innovation and advancement in the field. Her latest patent applications highlight her potential to impact the industry significantly.