Y C Chao

Title: Y C Chao: Innovator in Semiconductor Technology

Introduction

Y C Chao is a prominent inventor based in Hsin-Chu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of methods that enhance the reliability of semiconductor structures. With a total of 2 patents to his name, Chao's work is recognized for its innovative approaches to solving complex engineering challenges.

Latest Patents

Chao's latest patents include a method for forming zig-zag bordered openings in semiconductor structures. This invention discloses a via plug formed in a zig-zag bordered opening in a semiconductor structure, wherein the film stress in a barrier/glue layer of TiN can be significantly reduced. This reduction helps eliminate the occurrence of volcano defects, which can lead to delamination or peeling of the TiN layer from the contact opening. The method is easily implemented by providing a mask with a desirable zig-zag pattern during the photomasking step performed on the semiconductor device.

Career Highlights

Y C Chao is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor technology. His work has been instrumental in improving the manufacturing processes and reliability of semiconductor devices.

Collaborations

Chao has collaborated with notable colleagues, including C H Chen and Y M Tsui, who contribute to the innovative environment at their workplace.

Conclusion

Y C Chao's contributions to semiconductor technology exemplify the spirit of innovation and problem-solving in the field. His patents reflect a commitment to enhancing the performance and reliability of semiconductor structures, making a lasting impact on the industry.