Xueyu Qian

Title: Innovations by Xueyu Qian in Semiconductor Processing

Introduction

Xueyu Qian is a notable inventor based in Milpitas, CA, who has made significant contributions to the field of semiconductor processing. With a total of 6 patents to his name, Qian's work focuses on methodologies that enhance the efficiency and reliability of semiconductor manufacturing processes.

Latest Patents

One of Qian's latest patents is titled "Methodologies to reduce process sensitivity to the chamber condition." This invention provides a method and apparatus aimed at reducing the sensitivity of semiconductor processing to varying chamber conditions. The process repeatability of common semiconductor processes can be adversely affected by changing surface conditions, which alter the recombination rates of processing chemicals with chamber surfaces. In one aspect of this invention, a composition of one or more etchants is selected to optimize etch performance while minimizing deposition on chamber surfaces. This selection helps control the chamber surface condition, thereby minimizing changes in etch rates due to differing recombination rates of free radicals. Additionally, the etchant chemistry can be adjusted to reduce changes to internal surface conditions after a cleaning cycle. Another embodiment involves selecting a process recipe that reduces the sensitivity of the etch process to chamber conditions. Furthermore, chamber surface materials can be chosen to minimize differences in recombination rates of free radicals and the byproduct depositions formed during processing.

Another significant patent by Qian is the "Method of operating a dual chamber reactor with neutral density decoupled from ion density." This method pertains to operating a plasma reactor that includes a secondary chamber serving as a neutral species source for the main chamber. In this invention, the desired increase in main chamber neutral particle density is determined based on the ion density range, and the main chamber source power is maintained below a level that allows the secondary chamber to supply the required neutral density contribution.

Career Highlights

Throughout his career, Xueyu Qian has worked with prominent companies, including Applied Materials, Inc. His expertise in semiconductor processing has positioned him as a valuable asset in the industry.

Collaborations

Qian has collaborated with notable colleagues such as Songlin Xu and Robert E. Ryan, contributing to advancements in semiconductor technologies.

Conclusion

Xueyu Qian's innovative patents and contributions to semiconductor processing demonstrate his commitment to enhancing manufacturing efficiency and reliability. His work continues to influence the field and pave