The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2002
Filed:
Oct. 08, 1997
Patrick Leahey, San Jose, CA (US);
Jerry C. Chen, Sunnyvale, CA (US);
Richard E. Remington, Fremont, CA (US);
Simon Yavelberg, Cupertino, CA (US);
Timothy Driscoll, Hamilton, MT (US);
Robert E. Ryan, Sunnyvale, CA (US);
Brian Hatcher, San Jose, CA (US);
Rolf Guenther, Monte Sereno, CA (US);
Xueyu Qian, Milpitas, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A closed-loop, dome thermal control apparatus containing a high-volume fan, a heat exchange chamber, and an enclosure that encloses the fan and the heat exchange chamber. The fan blows air over a dome of a semiconductor wafer processing system and through the heat exchange chamber to uniformly control the temperature of a dome of a plasma chamber to prevent particle contamination of the wafer. The enclosure recirculates the temperature controlled air to the fan to form a closed-loop apparatus.