San Jose, CA, United States of America

Robert E Ryan


Average Co-Inventor Count = 6.2

ph-index = 6

Forward Citations = 1,211(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (1997 - 2002)
  • San Jose, CA (US) (2002)

Company Filing History:


Years Active: 1997-2002

Loading Chart...
6 patents (USPTO):

Title: Innovator Spotlight: Robert E Ryan - Pushing Boundaries in Plasma Technology

Introduction:

Robert E Ryan, a brilliant mind in innovation, hails from the vibrant hub of technology, San Jose, CA. With a remarkable portfolio of six patents under his belt, Ryan is known for his groundbreaking work in improving plasma substrate processing for enhanced efficiency and reduced defects.

Latest Patents:

1. "Plasma Reactor with Dynamic RF Inductive and Capacitive Coupling Control": This patent showcases Ryan's expertise in developing systems and methods to enhance plasma substrate processing. By dynamically adjusting RF inductive and capacitive coupling, the invention leads to improved plasma ignition, stability, and processing quality.

2. "Process Chamber Having a Voltage Distribution Electrode": Ryan's innovative process chamber design with a voltage distributive electrode efficiently distributes capacitive coupling between an inductive source and plasma. The design ensures uniform energy distribution over the dielectric window, enhancing overall performance.

Career Highlights:

Robert E Ryan is a valuable member of the innovative team at Applied Materials, Inc., a leading company in the field of advanced materials engineering. His contributions have significantly advanced the company's capabilities in plasma technology, setting new standards for excellence in the industry.

Collaborations:

Throughout his career, Ryan has collaborated closely with talented individuals such as Patrick Leahey and Xueyu Qian, further fueling innovation and driving progress in plasma technology. Their combined efforts have led to the development of cutting-edge solutions that address complex challenges in the field.

Conclusion:

In conclusion, Robert E Ryan stands as a testament to the power of innovation and ingenuity in the realm of plasma technology. His dedication to pushing boundaries, coupled with his inventive spirit, continues to shape the future of plasma substrate processing. With a remarkable track record of patents and a thriving career at Applied Materials, Inc., Ryan remains a key figure in driving technological advancements that make a lasting impact on the industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…