The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
Jun. 22, 2000
Applicant:
Inventors:
Valentin N. Todorov, Fremont, CA (US);
Robert E. Ryan, San Jose, CA (US);
Arthur Sato, San Jose, CA (US);
Jin-Yuan Chen, Bountiful, UT (US);
Xueyu Qian, San Jose, CA (US);
Zhiwen Sun, San Jose, CA (US);
Assignee:
Applied Materials Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F 1/00 ; C23C 1/6505 ; C23C 1/6507 ;
U.S. Cl.
CPC ...
C23F 1/00 ; C23C 1/6505 ; C23C 1/6507 ;
Abstract
The present invention provides a process chamber and voltage distributive electrode (VDE) which distributes capacitive coupling between an inductive source and a plasma in a process chamber. The VDE is preferably slotted defining energy opaque and energy transparent portions which enable inductive coupling into the chamber while distributing capacitive coupling uniformly over the dielectric window.