Xuerang Hu, an accomplished inventor based in San Jose, CA, is renowned for his significant contributions to multi-beam inspection technology. With an impressive portfolio of 50 patents, Hu has made notable advancements that enhance the efficiency and capability of inspection apparatuses in the semiconductor manufacturing industry.

Latest Patents

Among his latest patents, Hu introduced a "System and Method for Alignment of Secondary Beams in Multi-Beam Inspection Apparatus." This innovation features an adjustable beam separator designed to alter the path of a secondary particle beam using two independently controllable Wien filters aligned with a primary optical axis. Such a mechanism allows precise control over the effective bending point, optimizing beam alignment for enhanced inspection quality.

Another significant patent is "Apparatus Using Multiple Charged Particle Beams," which integrates an anti-rotation lens as an anti-rotation condenser lens in a multi-beam apparatus with a pre-beamlet-forming mechanism. This innovation effectively maintains the rotation angles of beamlets while adjusting current, thereby promoting high-resolution observations and thorough inspections of wafers and masks, proving to be a vital tool in yield management in the semiconductor field.

Career Highlights

Throughout his career, Xuerang Hu has been associated with prominent companies such as ASML Netherlands B.V. and Hermes Microvision Inc. His work in these organizations has significantly propelled advancements in multi-beam inspection technologies, marking him as a leading figure in his field.

Collaborations

Hu has collaborated with esteemed colleagues, including Xuedong Liu and Weiming Ren, contributing to innovative solutions and furthering the development of technologies that support efficient inspection processes. These partnerships have enhanced his research outcomes and broadened the impact of his inventions.

Conclusion

Xuerang Hu’s extensive patent portfolio and career achievements underscore his pivotal role in the realm of multi-beam inspection technologies. His latest inventions demonstrate a commitment to advancing the semiconductor industry through innovative solutions, setting a high standard for efficiency and precision. As technology evolves, Hu’s contributions will undoubtedly continue to influence the landscape of inspection apparatuses in manufacturing.

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