Company Filing History:
Years Active: 2023
Title: Xiumei Hu: Innovator in Semiconductor Manufacturing
Introduction
Xiumei Hu is a prominent inventor based in Shanghai, China. She has made significant contributions to the field of semiconductor manufacturing, holding 2 patents that showcase her innovative approaches. Her work is instrumental in advancing technology in this critical industry.
Latest Patents
Xiumei Hu's latest patents include a method for manufacturing a semiconductor device. This method involves providing a substrate with an amorphous silicon layer formed on it. An etching auxiliary layer is then created on the amorphous silicon layer, ensuring a flat upper surface. The process includes etching both the amorphous silicon layer and the etching auxiliary layer to achieve a target thickness, resulting in a flat upper surface on the etched amorphous silicon layer.
Another notable patent is also a method for manufacturing a semiconductor device. This method entails providing a substrate where a first gate structure for a dense area transistor and a second gate structure for an isolated area transistor are formed. The first gate structure is designed to be higher than the second. A buffer layer is formed over the second gate structure, and the top of the first gate structure is removed, followed by the formation of a hard mask filling layer on the top area of the first gate structure.
Career Highlights
Xiumei Hu is currently employed at Shanghai Huali Integrated Circuit Corporation, where she continues to push the boundaries of semiconductor technology. Her expertise and innovative mindset have made her a valuable asset to her organization.
Collaborations
Throughout her career, Xiumei has collaborated with notable colleagues, including Changhung Kung and Jianxun Chen. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Xiumei Hu's contributions to semiconductor manufacturing exemplify her dedication to innovation and excellence. Her patents reflect her ability to solve complex challenges in the industry, making her a key figure in the advancement of semiconductor technology.