Eindhoven, Netherlands

Xiaoxin Shang

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiaoxin Shang. Retrieved from https://idiyas.com/inventor/xiaoxin-shang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Xiaoxin Shang: Pioneering Innovation in Metrology Technology

Introduction:

Xiaoxin Shang, a visionary inventor based in Eindhoven, NL, is a true pioneer in the world of inventions with a relentless pursuit of innovation. His commitment to creating a better future through technology sets him apart as a prominent figure in the field of metrology.

Latest Patents:

With a keen focus on advancing metrology technology, Xiaoxin Shang holds one patent titled "Method of determining an optimal focus height for a metrology apparatus." This patent showcases his expertise in optimizing focus heights in metrology processes, revolutionizing the precision and accuracy of measurements in various applications.

Career Highlights:

Xiaoxin Shang is a valuable asset to ASML Netherlands B.V., where he channels his passion for innovation into groundbreaking technological advancements. His dedication to pushing boundaries and exploring new frontiers in metrology has earned him recognition as a leading innovator in the industry.

Collaborations:

In his professional journey, Xiaoxin Shang has collaborated with esteemed colleagues such as Mariya Vyacheslavivna Medvedyeva and Anagnostis Tsiatmas. Together, they have contributed to the development of cutting-edge metrology solutions that have redefined standards in the field.

Conclusion:

Xiaoxin Shang's unwavering commitment to innovation and his remarkable contributions to metrology technology position him as a true trailblazer in the realm of inventions. His pioneering spirit and collaborative efforts continue to shape the future of metrology, paving the way for transformative advancements that drive progress and excellence.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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