Asml Netherlands B.v.

Xiaoxin Shang

Hugo Augustinus Joseph Cramer

Anagnostis Tsiatmas

Bastiaan Onne Fagginger Auer

Bert Verstraeten

Mariya Vyacheslavivna Medvedyeva

Johan Maria Van Boxmeer

Martinus Hubertus Maria Van Weert

Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.

Method of determining an optimal focus height for a metrology apparatus

Growing community of inventors

Eindhoven, Netherlands

Xiaoxin Shang