The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Jan. 22, 2019
Asml Netherlands B.v., Veldhoven, NL;
Mariya Vyacheslavivna Medvedyeva, Eindhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Hugo Augustinus Joseph Cramer, Eindhoven, NL;
Martinus Hubertus Maria Van Weert, 's-Hertogenbosch, NL;
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Xiaoxin Shang, Eindhoven, NL;
Johan Maria Van Boxmeer, Sint-Oedenrode, NL;
Bert Verstraeten, Lommel, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Methods of determining an optimal focus height are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a target are obtained. Each application of the metrology process includes illuminating the target with a radiation spot and detecting radiation redirected by the target. The applications of the metrology process include applications at different nominal focus heights. The measurement data includes, for each application of the metrology process, at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal focus height for the metrology process using the obtained measurement data.