Xiaohua Ma

Title: Innovations of Xiaohua Ma in Semiconductor Technology

Introduction

Xiaohua Ma is a prominent inventor based in Xi'an, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of GaN-based devices. With a total of 3 patents to his name, his work has garnered attention for its innovative approaches and practical applications.

Latest Patents

One of Xiaohua Ma's latest patents is a GaN-based device that utilizes a patterned ohmic contact. This invention includes a substrate layer, a nucleation layer, a buffer layer, a channel layer, an insertion layer, a barrier layer, and a cap layer, all arranged sequentially from bottom to top. The design features ohmic contact recesses that extend into the channel layer, with unique arc-shaped and flat side walls. Additionally, the device incorporates two epitaxial layers within the recesses, along with a passivation layer that covers the cap layer and epitaxial layers. The configuration allows for effective source and drain electrodes, enhancing the device's performance.

Another notable patent involves a method for characterizing the ohmic contact electrode performance of semiconductor devices. This method includes preparing testing patterns, measuring resistance values, and calculating the sheet resistance of the ohmic contact area. The evaluation of the ohmic contact electrode performance is based on the obtained sheet resistance, providing a systematic approach to assessing semiconductor devices.

Career Highlights

Xiaohua Ma is affiliated with Xidian University, where he continues to advance research in semiconductor technology. His academic background and innovative spirit have positioned him as a key figure in his field.

Collaborations

Xiaohua Ma has collaborated with notable colleagues, including Yue Hao and Xuefeng Zheng, who contribute to his research endeavors. Their combined expertise fosters a dynamic research environment that promotes innovation.

Conclusion

Xiaohua Ma's contributions to semiconductor technology through his patents and research at Xidian University highlight his role as an influential inventor. His work not only advances the field but also paves the way for future innovations in semiconductor devices.