Beijing, China

Xiao-Long Li

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignees: Hon Hai Precision Industry Co., Ltd., Tsinghua University. Active years: 2018-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Xiao-Long Li. Retrieved from https://idiyas.com/inventor/xiao-long-li

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2018-2019

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2 patents (USPTO):Explore Patents

Title: Xiao-Long Li: Inventor of Advanced Sputtering Targets.

Introduction

Xiao-Long Li is an inventor associated with Beijing, China. His patent work includes innovations in indium cerium zinc oxide sputtering targets and their manufacture. The provided information lists 2 patents.

Latest Patents

Li’s listed patents focus on sputtering targets made with indium cerium zinc oxide, represented as InCeZnO, with a specified composition range of x = 0.5–2.

One patent describes a target with a relative density of at least 90%, a bulk resistance in a stated range, and more than 80% crystalline InCeZnO by weight.

The other patent covers both a sputtering target and a method for making it. The method mixes indium oxide, cerium oxide, and zinc oxide powders at an In:Ce:Zn molar ratio of 2:(0.5 to 2):1, then sinters the mixture at approximately 1,250°C to 1,650°C.

Career Highlights

The supplied career information associates Li with Hon Hai Precision Industry Co., Ltd. and Tsinghua University. These affiliations connect his patent activity with industry and academic research.

Collaborations

Li’s listed coworkers include Li Hui Guo and Shi-Lu Zhan. The available information identifies these individuals as coworkers but does not specify their roles in the patents.

Conclusion

Xiao-Long Li’s listed inventions address the composition and production of indium cerium zinc oxide sputtering targets, reflecting a focused contribution to materials and manufacturing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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