Wong-Cheng Shih

Title: Wong-Cheng Shih: Innovator in Semiconductor Technology

Introduction

Wong-Cheng Shih is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His innovative approaches have paved the way for advancements in capacitor structures and manufacturing processes.

Latest Patents

Wong-Cheng Shih's latest patents include a method of forming a protected crown capacitor structure that utilizes the outside crown surface to increase capacitance. This method features a polysilicon top plate structure overlying an array of individual polysilicon storage node structures. Each storage node structure is designed with tall, vertical features, and additional surface area is achieved by removing a butted insulator layer from a first group of surfaces. The insulator layer remains butted to a second group of surfaces to prevent the collapse of these tall features during subsequent processing sequences. Another notable patent is the method of producing low thermal budget high dielectric constant structures. This method reduces the thermal budget in semiconductor manufacturing processes by employing techniques such as plasma nitridation and oxidation, along with deposition processes like ALD and PVD. These innovations allow for the reliable manufacturing of smaller structures.

Career Highlights

Wong-Cheng Shih is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to develop cutting-edge technologies in semiconductor manufacturing. His work has been instrumental in enhancing the efficiency and performance of semiconductor devices.

Collaborations

Wong-Cheng Shih has collaborated with notable colleagues, including Tai Bor Wu and Chich Shang Chang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Wong-Cheng Shih's contributions to semiconductor technology through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor manufacturing processes.