The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2002

Filed:

Sep. 05, 2001
Applicant:
Inventors:

Wong-Cheng Shih, Kaohsiung, TW;

Tai Bor Wu, Hsin-Chu, TW;

Chich Shang Chang, Ba-Teh, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01G 4/008 ;
U.S. Cl.
CPC ...
H01G 4/008 ;
Abstract

Within both a method for forming a capacitor and a capacitor formed employing the method, there is employed for forming at least part of at least one of a first capacitor plate and a second capacitor plate a tungsten rich tungsten oxide material having a tungsten:oxygen atomic ratio of from about 5:1 to about 1:1. By forming the at least part of the at least one of the first capacitor plate and the second capacitor plate of the foregoing tungsten rich tungsten oxide material, the capacitor is formed with attenuated leakage current density.


Find Patent Forward Citations

Shih, Wong-Cheng. (2002). Microelectronic capacitor with capacitor plate layer formed of tungsten rich tungsten oxide material (U.S. Patent No. 6456482). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6456482

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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