William Fruchterman is a prominent inventor based in Santa Clara, California. He has made significant contributions to the field of physical vapor deposition (PVD) technology. With a total of 10 patents to his name, Fruchterman has established himself as a key figure in advancing manufacturing processes.

Latest Patents

Fruchterman's latest patents include innovative methods and apparatus for physical vapor deposition dielectric deposition. One notable patent focuses on reducing burn-in time of a PVD shield. This involves sputtering a dielectric target with a specific dielectric constant to form a dielectric layer on the shield's inner surface. The shield features an aluminum oxide coating that helps minimize burn-in time by ensuring that the dielectric constants are substantially similar. Another significant patent addresses controlling ion fraction in PVD processes. This patent describes a process chamber designed to optimize substrate processing through the strategic placement of magnets that generate magnetic fields to redistribute ions over the substrate.

Career Highlights

Fruchterman is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display manufacturing industry. His work has been instrumental in enhancing the efficiency and effectiveness of PVD processes, contributing to advancements in various technological applications.

Collaborations

Throughout his career, Fruchterman has collaborated with notable colleagues, including Martin Lee Riker and Xiaodong Wang. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

William Fruchterman's contributions to the field of physical vapor deposition have had a lasting impact on manufacturing technologies. His innovative patents and collaborations continue to shape the future of the industry.

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