Werner Graf

Title: Werner Graf: Innovator in Semiconductor Technology

Introduction

Werner Graf is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on advanced methods for enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is titled "Top corner rounding by implant-enhanced wet etching." This innovation addresses the challenge of filling high aspect ratio apertures with metals, such as copper, in metallization layers of advanced semiconductor devices. The method involves an ion implantation step followed by a wet etch, which effectively forms the required apertures in the insulating layer of semiconductor devices.

Another notable patent is "Interconnect structure for semiconductor devices." This invention relates to an integrated circuit formed on a semiconductor body, featuring interconnects between the source and drain regions of transistors. The design includes a metal body positioned beneath the surface of the semiconductor, with a contact element that establishes electrical connections between the metal body and the transistor regions.

Career Highlights

Throughout his career, Werner Graf has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Qimonda AG. His expertise and innovative approaches have significantly impacted the development of semiconductor technologies.

Collaborations

Werner has collaborated with notable professionals in the field, including Lars Heineck and Martin Popp. Their combined efforts have contributed to advancements in semiconductor device design and manufacturing.

Conclusion

Werner Graf's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of semiconductor devices.