Hsinchu, Taiwan

Wen-Jye Chung

This inventor holds 10 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 1996-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wen-Jye Chung. Retrieved from https://idiyas.com/inventor/wen-jye-chung

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 6

Forward Citations = 101(Granted Patents)


Location History:

  • Shuang-Shi, TW (1997)
  • Shuang-Shi-Hsiao-Cheng, TW (1999)
  • Hsin-Chu, TW (1996 - 2001)
  • Baw-Shian, TW (2000 - 2001)

Company Filing History:


Years Active: 1996-2001

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10 patents (USPTO):Explore Patents

Title: Innovations by Wen-Jye Chung

Introduction

Wen-Jye Chung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 10 patents. His work focuses on developing advanced technologies that enhance the efficiency and effectiveness of coating and alignment processes in semiconductor fabrication.

Latest Patents

One of his latest patents is the "Dual-cup coating apparatus." This innovative liquid coating apparatus is designed for dispensing two or more different liquids simultaneously. The apparatus features two separate drain cups, with an upper drain cup constructed in a toroidal shape. This design allows for the withdrawal of the upper cup to enable the lowering of a wafer platform and a liquid spray nozzle into a lower drain cup for dispensing a second liquid material. This novel apparatus effectively prevents chemical reactions between different liquids, thereby avoiding particle formation and contamination issues.

Another significant patent is the "Capacitor circuit structure for determining overlay error." This structure is suitable for aligning two patterned conductive layers separated by a dielectric layer. It includes a square in the lower pattern and four T-shaped capacitor electrodes in the upper pattern. When aligned correctly, the capacitance value measured between any top electrode and the square remains consistent. However, misalignment alters the degree of overlap, allowing for precise measurement of misalignment through capacitance comparisons.

Career Highlights

Wen-Jye Chung is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., where he continues to innovate and contribute to the semiconductor industry. His expertise in coating and alignment technologies has positioned him as a key figure in advancing manufacturing processes.

Collaborations

Wen-Jye Chung collaborates with talented individuals such as Chu-Mei Lee and Kuo-Chyuan Tzeng. Their combined efforts in research and development have led to significant advancements in semiconductor technologies.

Conclusion

Wen-Jye Chung's contributions to the field of semiconductor manufacturing through his innovative patents demonstrate his commitment to advancing technology. His work not only enhances manufacturing processes but also addresses critical challenges in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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