The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 2000
Filed:
Jun. 14, 1999
Kuo-Chyuan Tzeng, Chu-pei, TW;
Wen-Jye Chung, Baw-Shian, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A structure suitable for aligning two patterned conductive layers that are separated by a dielectric layer is described. Included in the lower pattern is a square and, as part of the upper pattern, four T-shaped capacitor electrodes are provided. The latter are positioned so that, when the alignment is exact, they all overlap the square by the same amount. Thus, under conditions of exact alignment, the capacitance value measured between any one of the top electrodes and the square will be the same for all electrodes. When, however, misalignment occurs, the degree of overlap will change, increasing on one side of the square while decreasing at the opposite side. In this way a comparison of measured capacitance values between electrodes located on opposing sides of the square will indicate whether, and what extent, misalignment has occurred.