Hsinchu, Taiwan

Wen-Jya Liang


Average Co-Inventor Count = 3.0

ph-index = 3

Forward Citations = 75(Granted Patents)


Company Filing History:


Years Active: 1998-2012

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5 patents (USPTO):

Title: **Innovator Spotlight: Wen-Jya Liang**

Introduction

Wen-Jya Liang is a distinguished inventor based in Hsinchu, Taiwan. With a robust portfolio that includes five patents, Liang has made significant contributions to the field of semiconductor technology. His innovative designs have revolutionized the way high-power applications are approached in the industry.

Latest Patents

Liang's latest patents encompass groundbreaking advancements in semiconductor devices, particularly for high-power and high-voltage applications. One of his notable patents details a high-power semiconductor device featuring a first type doped semiconductor substrate and a second type doped epitaxial layer. This device includes a complex arrangement of body regions and heavily doped drain regions, enabling enhanced functionality and efficiency.

Another significant patent focuses on the method of forming a shallow trench isolation structure. This method outlines a systematic approach to creating a trench within a substrate that incorporates a pad oxide layer and a mask layer. The detailed steps illustrate how to achieve effective isolation of semiconductor devices, which is crucial for improving performance and reducing interference in high-density applications.

Career Highlights

Wen-Jya Liang is currently affiliated with Vanguard International Semiconductor Corporation, a leading company in the semiconductor industry. His expertise in semiconductor device fabrication and innovative methodologies has solidified his reputation as a top inventor in the field. Liang's work has not only contributed to his own professional growth but has also played a pivotal role in the advancements of the technology sector.

Collaborations

Throughout his career, Liang has collaborated with notable colleagues, including Bin Liu and Yin-Pin Wang. These collaborations have fostered a dynamic environment for innovation, allowing for the exchange of ideas and the development of cutting-edge technologies. Wang, in particular, brings a unique perspective to their team, further enhancing their collective capabilities in semiconductor research and development.

Conclusion

Wen-Jya Liang's contributions to the semiconductor industry are both impressive and impactful. With multiple patents to his name and ongoing advancements in technology, Liang continues to push the boundaries of innovation. His work not only emphasizes the critical nature of semiconductor devices for high-power applications but also showcases the importance of collaboration in driving technological progress.

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