The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 1998

Filed:

May. 02, 1997
Applicant:
Inventors:

Bin Liu, Taipei, TW;

Wen-Jya Liang, Hsinchu, TW;

Yeh-Sen Lin, Tao Yuan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
438253 ; 438595 ; 438675 ;
Abstract

This present invention is a method of fabricating a semiconductor memory cell in a DRAM. This invention utilizes a inter plug technique and nitride sidewall spacers to improve deep node contact etching damage and reduce the number of mask steps for typical landing pad processes. Thus, the method of this invention allows the manufacture of a semiconductor memory cell that reduces the difficulties due to the high aspect ratio of the contact hole of a storage node.


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