Jhudong, Taiwan

Wen-Hsiang Lin


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2014-2016

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2 patents (USPTO):Explore Patents

Title: **Innovator Spotlight: Wen-Hsiang Lin**

Introduction

Wen-Hsiang Lin is a noteworthy inventor based in Jhudong, Taiwan. With two patents to his name, Lin has made significant contributions to the field of semiconductor technology. His innovative approaches have paved the way for advancements in semiconductor device fabrication.

Latest Patents

Wen-Hsiang Lin's latest patents showcase his expertise in semiconductor device creation. The first patent describes a method of forming a semiconductor device, which involves depositing a light reflecting layer over a substrate, forming a protection layer, and creating an anti-reflective coating (ARC) layer. An essential aspect of this method is the wet removal of the ARC layer using hydrogen peroxide (H2O2) at a precise flow rate.

His second patent focuses on MEMS nanostructures and methods for their formation. This method includes the recessing of a substrate to create mesas, followed by the deposition of a light reflecting layer, and forming an ARC layer. The process culminates in the removal of specific layers to reveal the top surfaces of the mesas.

Career Highlights

Wen-Hsiang Lin works at Taiwan Semiconductor Manufacturing Company Limited, a leading entity in semiconductor manufacturing. His role at the company has enabled him to apply his inventive ideas to practical applications, significantly influencing semiconductor technology.

Collaborations

Throughout his career, Lin has collaborated with talented colleagues, including Yi-Hsien Chang and Chun-Ren Cheng. These partnerships have likely fostered an innovative environment conducive to producing groundbreaking solutions within the industry.

Conclusion

Wen-Hsiang Lin's contributions to semiconductor technology highlight the importance of innovation in advancing modern electronics. His patents not only represent individual achievement but also contribute to the wider advancements in the semiconductor field. As technology continues to evolve, Wen-Hsiang Lin's work will undoubtedly play a pivotal role in shaping the future.

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