Wen Hao Liu

Title: Innovations of Wen Hao Liu in Optical Proximity Correction

Introduction

Wen Hao Liu is a notable inventor based in Hsinchu County, Taiwan. He has made significant contributions to the field of computational lithography, particularly in optical proximity correction (OPC) methodologies. With a total of 3 patents, his work has enhanced the printability of lithography processes in integrated circuit design.

Latest Patents

One of his latest patents focuses on an optical proximity correction methodology using pattern classification for target placement. This innovative approach involves receiving an integrated circuit (IC) design layout that contains an IC pattern. The method generates target points for a contour corresponding to the IC pattern based on a target placement model, which is selected according to the classification of the IC pattern. The OPC is then performed on the IC pattern using these target points, resulting in a modified IC design layout. Additionally, the method includes fabricating a mask based on this modified layout. The OPC can also select an OPC model based on the classification of the IC pattern, allowing for a weighted target placement model.

Career Highlights

Wen Hao Liu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in lithography and semiconductor manufacturing. His work has been instrumental in advancing the capabilities of the company in producing high-quality integrated circuits.

Collaborations

Wen Hao Liu has collaborated with several talented individuals in his field, including Wen-Chun Huang and Hung-Chun Wang. Their combined efforts have contributed to the success of various projects and innovations in semiconductor technology.

Conclusion

Wen Hao Liu's contributions to optical proximity correction methodologies have significantly impacted the field of computational lithography. His innovative approaches continue to enhance the printability of integrated circuit designs, showcasing his expertise and dedication to advancing technology.