The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Apr. 12, 2010
Wen Hao Liu, Zhubei, TW;
Hsien-huang Liao, Hsinchu, TW;
Chi-cheng Hung, Toufen Township, Miaoli County, TW;
Wen-chun Huang, Xi-Gang Xiang, TW;
Ru-gun Liu, Hsinchu, TW;
Wen Hao Liu, Zhubei, TW;
Hsien-Huang Liao, Hsinchu, TW;
Chi-Cheng Hung, Toufen Township, Miaoli County, TW;
Wen-Chun Huang, Xi-Gang Xiang, TW;
Ru-Gun Liu, Hsinchu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
Embodiments of the present disclosure provide methods and apparatuses for integrated circuits. An exemplary integrated circuit (IC) method includes providing an IC design layout that includes a design feature; determining a dimensional difference between the design feature and a corresponding developed photoresist feature of a photoresist layer; modifying the CD of the design feature to compensate for the difference, thereby generating a modified IC design layout; and making a mask using the modified IC design layout.