Company Filing History:

6 out of 54,814

Intel Corporation

patents

Years Active: 2005-2010

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7807319 - Photomask including contrast enhancement layer and method of making same (2010-10-05),

2. 7695872 - Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret (2010-04-13),

3. 7282306 - Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret (2007-10-16),

4. 7160651 - Manufacturable chromeless alternating phase shift mask structure with phase grating (2007-01-09),

5. 7014956 - Active secondary exposure mask to manufacture integrated circuits (2006-03-21),

6. 6942958 - Modifying circuitry features in radiation sensitive layers with active secondary exposure masks (2005-09-13),

Title: Celebrating the Innovations of Inventor Wen-Hao Cheng

Introduction: Wen-Hao Cheng, a prominent inventor based in Fremont, CA, has made significant contributions to the field of photomask technology. With a remarkable portfolio of six patents to her name, Wen-Hao has pioneered advancements that enhance optical technologies, particularly in the semiconductor industry.

Latest Patents: Among her latest innovations, Wen-Hao Cheng developed a photomask that includes a contrast enhancement layer and a method for fabricating it. This photomask features a plate that defines transparent regions in a predetermined pattern alongside opaque regions, designed to effectively transmit light. Additionally, she has introduced a continuous sloped phase edge architecture fabrication technique, which utilizes a beam blur—whether through electron or optical means—to produce phase shift masks. This inventive approach may offer 'trimless' capabilities, thereby eliminating the need for a secondary binary 'trim' mask that typically resolves phase conflicts after exposure.

Career Highlights: Cheng works at Intel Corporation, a leading technology company renowned for its cutting-edge innovations in semiconductor manufacturing. Her expertise in photomask design and fabrication is vital for enhancing the performance of next-generation microchips, reinforcing her standing as a key innovator in her field.

Collaborations: Throughout her career, Wen-Hao Cheng has had the opportunity to collaborate with notable colleagues such as Fred T. Chen and Jeff N. Farnsworth. These collaborations have furthered development in photolithography techniques and fortified advancements in optical device technologies.

Conclusion: Wen-Hao Cheng's contributions to optical technology through her inventive spirit and commitment to innovation exemplify the importance of research and development in the tech industry. With her ongoing work at Intel Corporation and her impressive patent portfolio, she continues to shape the future of semiconductor technologies.

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