The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Aug. 20, 2007
Matt F. Vernon, Los Gatos, CA (US);
Wen-hao Cheng, Fremont, CA (US);
Matt F. Vernon, Los Gatos, CA (US);
Wen-Hao Cheng, Fremont, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be 'trimless', i.e., not require a corresponding binary 'trim' mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile