Company Filing History:
Years Active: 2017-2022
Title: Innovations of Wen-Cheng Lo in FinFET Technology
Introduction
Wen-Cheng Lo is a notable inventor based in Zhubei, Taiwan, recognized for his contributions to the field of semiconductor technology. He holds three patents that focus on advanced methods for forming FinFET devices, which are crucial for modern electronic applications.
Latest Patents
Wen-Cheng Lo's latest patents include innovative techniques for enhancing the performance of FinFET devices. One of his patents describes a method of forming a FinFET device by implantation through a capping layer. This method involves creating a capping layer over a fin structure, forming an amorphous region within the fin structure, and performing an annealing process to recrystallize the amorphous region. The capping layer plays a vital role in enabling the fin structure to retain stress effects induced by these processes. Another patent focuses on dislocation stress memorization techniques for FinFET devices, emphasizing similar methods to enhance device performance.
Career Highlights
Wen-Cheng Lo is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to develop and refine his innovative techniques in semiconductor fabrication.
Collaborations
Wen-Cheng Lo collaborates with talented professionals in his field, including his coworker Sun-Jay Chang, who is also a significant contributor to their projects.
Conclusion
Wen-Cheng Lo's innovative work in FinFET technology showcases his expertise and commitment to advancing semiconductor manufacturing. His patents reflect a deep understanding of the complexities involved in device fabrication, making him a valuable asset to the industry.