Weiyi Luo

Title: Innovations by Weiyi Luo in Substrate Processing Systems

Introduction

Weiyi Luo is an accomplished inventor based in Fremont, CA, with a notable portfolio of four patents. Her work primarily focuses on advancements in substrate processing systems, particularly in the field of gas distribution devices and plasma technology.

Latest Patents

Weiyi Luo's latest patents include innovative systems and methods for metastable activated radical selective strip and etch using dual plenum showerheads. These patents detail several designs of a gas distribution device for substrate processing systems, which includes a dual plenum showerhead. Additionally, her patents describe a substrate processing system that selectively etches a substrate using a first chamber and a second chamber. The first gas delivery system supplies an inert gas species to the first chamber, while a plasma generating system creates plasma that includes ions and metastable species. The gas distribution device plays a crucial role in removing ions from the plasma, blocking ultraviolet (UV) light, and delivering metastable species to the second chamber. This innovative approach allows for selective etching of materials on the substrate.

Career Highlights

Throughout her career, Weiyi Luo has worked with prominent companies in the semiconductor industry, including Applied Materials, Inc. and Lam Research Corporation. Her contributions to these organizations have significantly advanced the technology used in substrate processing.

Collaborations

Weiyi has collaborated with notable professionals in her field, including Robert Chen and Canfeng Lai. These partnerships have fostered innovation and development in her projects.

Conclusion

Weiyi Luo's contributions to substrate processing systems through her patents and collaborations highlight her role as a leading inventor in the field. Her work continues to influence advancements in semiconductor technology.