San Jose, CA, United States of America

Weinan Jiang


Average Co-Inventor Count = 6.1

ph-index = 7

Forward Citations = 608(Granted Patents)


Location History:

  • Santa Clara, CA (US) (1998)
  • San Jose, CA (US) (1999 - 2013)

Company Filing History:


Years Active: 1998-2013

Loading Chart...
8 patents (USPTO):Explore Patents

Title: Weinan Jiang: Innovator in Plasma Processing Technologies

Introduction

Weinan Jiang is a prominent inventor based in San Jose, CA, known for his significant contributions to plasma processing technologies. With a total of 8 patents to his name, Jiang has developed innovative methods and apparatuses that enhance the efficiency and precision of plasma etching processes.

Latest Patents

One of Jiang's latest patents is a plasma processing method and apparatus that controls plasma excitation power. This invention allows for the gradual change of RF power supplied to a plasma in a vacuum processing chamber based on preprogrammed signals stored in a computer memory. This method ensures that other parameters, such as pressure, gas species, and gas flow rates, remain constant during the process. The result is the ability to etch rounded corners instead of sharp edges, particularly at the intersection of trench walls and bases.

Another notable patent focuses on etch endpoint detection. This method involves estimating the etch endpoint and directing radiant energy at multiple wavelengths onto the layer being etched. By detecting intensity maxima and minima at different wavelengths, Jiang's method provides a reliable way to determine the endpoint of the etching process, ensuring precision in the final product.

Career Highlights

Throughout his career, Weinan Jiang has worked with leading companies in the semiconductor industry, including Applied Materials, Inc. and Lam Research Corporation. His experience in these organizations has allowed him to refine his expertise in plasma processing and etching technologies.

Collaborations

Jiang has collaborated with notable professionals in his field, including Jeffrey D. Chinn and Ajay Kumar. These collaborations have contributed to the advancement of plasma processing technologies and have fostered innovation within the industry.

Conclusion

Weinan Jiang's contributions to plasma processing technologies have made a significant impact on the semiconductor industry. His innovative patents and collaborations with industry leaders highlight his role as a key inventor in this field.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…