Company Filing History:
Years Active: 2005-2025
Title: Innovations and Contributions of Inventor Wei Wang
Introduction
Wei Wang is a prominent inventor based in Changchun, China. He has made significant contributions to the field of optics and holography, holding a total of seven patents. His work focuses on developing methods and devices that enhance the quality and precision of optical measurements.
Latest Patents
One of Wei Wang's latest patents is titled "Method and device for compensating surface error of holographic grating substrate." This invention addresses the challenges posed by surface processing errors in holographic grating research. By utilizing scanning and exposure technology, the method improves the full-aperture diffraction wavefront quality of gratings. It achieves this through a sophisticated coordination between feedback from displacement measurement apparatus and modulation of the scanning beam interference lithography system.
Another notable patent is the "Hybrid displacement measuring device." This invention integrates grating and laser measurement techniques to provide a comprehensive solution for displacement measurement. The device includes a worktable, a grating ruler, a laser light source, and two measuring assemblies. This hybrid approach effectively addresses the difficulties in ensuring both range and precision in displacement measurements.
Career Highlights
Wei Wang has worked with esteemed institutions such as the Chinese Academy of Sciences and the Changchun Institute of Biological Products, which is part of the Ministry of Public Health. His experience in these organizations has contributed to his expertise in optics and measurement technologies.
Collaborations
Throughout his career, Wei Wang has collaborated with notable colleagues, including Wenhao Li and Zhaowu Liu. These partnerships have fostered innovation and advancements in their respective fields.
Conclusion
Wei Wang's contributions to the field of optics and holography are noteworthy, with his innovative patents addressing critical challenges in measurement precision and quality. His work continues to influence advancements in optical technologies.
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