Wei-Ting Wu

Title: Innovations of Wei-Ting Wu

Introduction

Wei-Ting Wu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on the development and fabrication of advanced semiconductor devices, which are crucial for modern electronics.

Latest Patents

Wei-Ting Wu's latest patents include a "Fabricating method of lateral-diffused metal oxide semiconductor device." This invention describes a lateral-diffused metal oxide semiconductor device that consists of a substrate, a second deep well, a gate, a source, a drain, and a first dopant region. The substrate features a first deep well with a first conductive type, while the second deep well has a second conductive type and is situated within the first deep well. The gate is positioned on the substrate, marking the boundary between the first and second deep wells. The source and drain, both of the second conductive type, are located adjacent to the gate within the respective deep wells. Additionally, a method for fabricating this lateral-diffused metal oxide semiconductor device is provided.

Another notable patent is the "Semiconductor device and operating method thereof." This invention outlines a semiconductor device that includes a P-type substrate, a P-type first well region, an N-type second well region, a gate, N-type source and drain regions, a dummy gate, and an N-type deep well region. The first well region is integrated into the substrate, while the second well region is positioned near the first well region. The gate covers portions of both well regions. The source region is located in the first well region on one side of the gate, and the drain region is situated in the second well region on the opposite side. The dummy gate is placed between the gate and the drain region, and the deep well region surrounds both well regions. An operational method for this semiconductor device is also included.

Career Highlights

Wei-Ting Wu has worked with notable organizations such as United Microelectronics Corporation and National Cheng Kung University. His experience in these institutions has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Some of his coworkers include Ming-Shing Chen and Ming-Hui Chang. Their collaboration has likely fostered a productive environment for research and development in semiconductor innovations.

Conclusion