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For the Inventor, By the Inventor

Banqiao, Taiwan

Wei Te Hsu

This inventor holds 5 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 2012-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Te Hsu. Retrieved from https://idiyas.com/inventor/wei-te-hsu-4m9jqqmr

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 5

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Taipei County, TW (2013)
  • Banqiao, TW (2012 - 2014)

Company Filing History:

goldMedal5 out of 9,312 
 
Industrial Technology Research Institute
 patents

Years Active: 2012-2014

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5 patents (USPTO):Explore Patents
1. 8699021 - System, method and computer readable medium for through silicon via structure measurement (2014-04-15),
2. 8386969 - Method for designing overlay targets and method and system for measuring overlay error using the same (2013-02-26),
3. 8321821 - Method for designing two-dimensional array overlay targets and method and system for measuring overlay errors using the same (2012-11-27),
4. 8250497 - Method for designing two-dimensional array overlay target sets and method and system for measuring overlay errors using the same (2012-08-21),
5. 8139233 - System and method for via structure measurement (2012-03-20),

Title: Biography of Inventor Wei Te Hsu

Introduction: Wei Te Hsu is a prominent inventor based in Banqiao, Taiwan. He has made significant contributions to the field of technology, particularly in the area of semiconductor measurement and design.

Latest Patents: Wei Te Hsu holds five patents, with his latest innovations including a system, method, and computer-readable medium for through silicon via structure measurement. This system utilizes a reflectometer that emits a broadband light beam to measure the depth of TSV structures based on the reflection spectrum received. Another notable patent is a method for designing overlay targets and a system for measuring overlay error, which involves selecting overlay target pairs with varying overlay errors and designing them based on structural parameters.

Career Highlights: Wei Te Hsu is affiliated with the Industrial Technology Research Institute, where he has been instrumental in advancing research and development in semiconductor technologies. His work has garnered recognition for its innovative approach and practical applications.

Collaborations: Throughout his career, Wei has collaborated with esteemed colleagues such as Yi Sha Ku and Hsiu Lan Pang. These partnerships have contributed to the success of his projects and the advancement of technology in their field.

Conclusion: Wei Te Hsu's contributions to technology and innovation have established him as a key figure in the semiconductor industry. His patents reflect his commitment to improving measurement techniques and design methodologies, making a lasting impact on the field

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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