The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
Dec. 28, 2009
Yi Sha Ku, Hsinchu, TW;
Hsiu Lan Pang, Baoshan Township, Hsinchu County, TW;
Wei Te Hsu, Banqiao, TW;
Deh Ming Shyu, Jhunan Township, Miaoli County, TW;
Yi Sha Ku, Hsinchu, TW;
Hsiu Lan Pang, Baoshan Township, Hsinchu County, TW;
Wei Te Hsu, Banqiao, TW;
Deh Ming Shyu, Jhunan Township, Miaoli County, TW;
Industrial Technology Research Institute, Chutung, Hsinchu, TW;
Abstract
A method for designing a two-dimensional array overlay target comprises the steps of: selecting a plurality of two dimensional array overlay targets having different overlay errors; calculating a deviation of a simulated diffraction spectrum for each two-dimensional array overlay target; selecting an error-independent overlay target by taking the deviations of the simulated diffraction spectra into consideration; and designing a two dimensional array overlay target based on structural parameters of the error-independent overlay target.