This inventor holds 3 USPTO granted patents. Top assignee: Industrial Technology Research Institute. Active years: 2012.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2012
Title: Hsiu Lan Pang: Innovator in Overlay Target Design
Introduction
Hsiu Lan Pang is a notable inventor based in Baoshan, China. He has made significant contributions to the field of overlay target design, holding a total of 3 patents. His work focuses on methods that enhance the accuracy of overlay measurements, which are crucial in various technological applications.
Latest Patents
Hsiu Lan Pang's latest patents include innovative methods for designing two-dimensional array overlay targets. One of his patents describes a method for designing a two-dimensional array overlay target that involves selecting multiple targets with varying overlay errors. The process includes calculating deviations of simulated diffraction spectra and selecting an error-independent overlay target based on these deviations. Another patent outlines a method for designing a two-dimensional array overlay target set, which similarly involves selecting target sets with different overlay errors and designing based on sensitive overlay target sets.
Career Highlights
Hsiu Lan Pang is affiliated with the Industrial Technology Research Institute, where he applies his expertise in overlay target design. His work has been instrumental in advancing the methodologies used in overlay error measurement, contributing to improved precision in various technological fields.
Collaborations
Hsiu Lan Pang collaborates with talented colleagues, including Wei Te Hsu and Yi Sha Ku. Their combined efforts in research and development have led to significant advancements in their respective areas of expertise.
Conclusion
Hsiu Lan Pang's innovative work in overlay target design and measurement has established him as a key figure in his field. His contributions continue to influence technological advancements and improve measurement accuracy.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
