Wei-Liang Chen

Title: Innovations of Wei-Liang Chen

Introduction

Wei-Liang Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of eight patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "Method and system for forming metal-insulator-metal capacitors." This invention provides a semiconductor processing system designed to form a capacitor dielectric layer in a metal-insulator-metal capacitor. The system includes a precursor tank that generates a precursor gas from a metal organic solid precursor, a processing chamber for plasma enhanced chemical vapor deposition, and at least one buffer tank connecting the precursor tank and the processing chamber.

Another notable patent is "Surface damage control in diodes." This patent discloses a semiconductor device and a method of forming it. The device comprises a substrate with a first well region and a second well region, each containing different types of dopants. Additionally, it features an array of well regions, a metal silicide layer, a metal silicide nitride layer, and a contact structure, all designed to improve device performance.

Career Highlights

Wei-Liang Chen has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and the Industrial Technology Research Institute. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in semiconductor manufacturing.

Collaborations

Throughout his career, Wei-Liang Chen has collaborated with notable colleagues, including Yu-Lung Yeh and Yen-Hsiu Chen. These partnerships have contributed to the advancement of semiconductor technologies and the successful development of his patented inventions.

Conclusion

Wei-Liang Chen's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor devices.