Wei-kun Yeh

Title: Innovations of Wei-kun Yeh

Introduction

Wei-kun Yeh is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on advanced methods for forming semiconductor devices, showcasing his expertise and innovative thinking.

Latest Patents

Wei-kun Yeh's latest patents include a method for forming a semiconductor device that utilizes a composite dielectric layer. This method involves creating a first dielectric layer over a conductive layer on a substrate, followed by the formation of a second dielectric layer with a higher etch rate. The process allows for the creation of a rounded contoured recess, which is essential for the alignment of the via. Another notable patent is the method of multi-step reactive ion etch for patterning adjoining metallization layers. This method enhances the precision of patterned conductor metallization layers on semiconductor substrates, utilizing a reactive ion etch process for effective patterning.

Career Highlights

Wei-kun Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to develop and refine his innovative techniques, contributing to the advancement of semiconductor manufacturing processes.

Collaborations

Throughout his career, Wei-kun Yeh has collaborated with notable colleagues, including J S Shiao and A M Chiang. These collaborations have fostered a productive environment for innovation and have led to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Wei-kun Yeh's contributions to semiconductor technology through his patents and career at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor manufacturing processes.