Wei-Chun Chang

Title: Wei-Chun Chang: Innovator in Semiconductor Technology

Introduction

Wei-Chun Chang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of metal-oxide-semiconductor transistors. With a total of 3 patents to his name, Chang continues to push the boundaries of innovation in this critical area of electronics.

Latest Patents

Chang's latest patents include a manufacturing method of an anti punch-through leakage current metal-oxide-semiconductor transistor. This innovative method involves forming a high voltage deep first type well region and a first type light doping region in a second type substrate. A mask with a dopant implanting opening is created on the substrate, allowing for the formation of an anti punch-through leakage current structure through the implantation of the first type dopant. The doping concentration of the first type dopant in the high voltage deep first type well region is carefully controlled to optimize performance. Additionally, a second type body is formed by implanting a second type dopant, culminating in the creation of a gate structure on the substrate.

Career Highlights

Wei-Chun Chang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on enhancing the efficiency and reliability of semiconductor devices, which are essential for modern electronic applications.

Collaborations

Chang collaborates with talented colleagues such as Chun-Yao Lee and Chin-Lung Chen. Together, they contribute to advancements in semiconductor technology, fostering innovation and excellence in their field.

Conclusion

Wei-Chun Chang's contributions to semiconductor technology through his patents and work at United Microelectronics Corporation highlight his role as a key innovator in the industry. His ongoing efforts continue to shape the future of electronics.