Wei-Ching Wu

Title: Innovations of Wei-Ching Wu in Semiconductor Technology

Introduction

Wei-Ching Wu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on advanced methods and systems that enhance the manufacturing processes of semiconductor devices.

Latest Patents

One of Wei-Ching Wu's latest patents is a method of using a high-density plasma chemical vapor deposition chamber. This method involves comparing the thickness profile of a wafer's surface with a reference value using a control unit. The process includes transmitting a control signal to an adjustable nozzle based on this comparison. Additionally, the method incorporates rotating the adjustable nozzle about its longitudinal axis in response to the control signal. Another notable patent is for a high-density plasma chemical vapor deposition (HDP CVD) chamber. This chamber features a nozzle with a hollow center portion for conducting gas and an adjustable baffle nozzle positioned in the top portion of the chamber.

Career Highlights

Wei-Ching Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative approaches have contributed to the advancement of semiconductor manufacturing techniques, making him a valuable asset to his company.

Collaborations

Throughout his career, Wei-Ching Wu has collaborated with notable colleagues, including Wen-Long Lee and Ding-I Liu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Wei-Ching Wu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key inventor in the industry. His innovative methods continue to influence the development of advanced semiconductor manufacturing processes.