This inventor holds 5 USPTO granted patents and 2 published patent applications. Top assignee: Nan Ya Technology Corporation. Active years: 2010-2014.
Location History:
- Gueishan Township, Taoyuan County, TW (2010)
- Taoyuan County, TW (2012 - 2014)
Company Filing History:
Years Active: 2010-2014
Title: Innovations of Wei-Cheng Shiu in Photolithography
Introduction
Wei-Cheng Shiu is a prominent inventor based in Taoyuan County, Taiwan. He has made significant contributions to the field of photolithography, holding a total of 5 patents. His work focuses on enhancing imaging quality and resolution in lithography apparatuses.
Latest Patents
One of his latest patents involves a photomask designed for use in photolithography apparatuses. This photomask includes a substrate with a mask pattern that features at least one main pattern and several sub-resolution assistant features (SRAFs). The SRAFs are strategically placed around the main pattern, with a specific distance maintained to improve imaging quality on the wafer.
Another notable patent is for a lithography apparatus equipped with an optical fiber module. This apparatus consists of a light source, a photomask, a lens, and a wafer stage. The optical fiber module is designed to create a gap smaller than the wavelength of the light source, which enhances resolution through a near-field effect. This innovation allows deep ultraviolet (DUV) light to pass through the optical fiber module effectively.
Career Highlights
Wei-Cheng Shiu is currently employed at Nan Ya Technology Corporation, where he continues to develop cutting-edge technologies in the field of photolithography. His expertise and innovative approach have positioned him as a key figure in advancing lithography techniques.
Collaborations
Throughout his career, Wei-Cheng has collaborated with talented individuals such as Ya-Chih Wang and Hai-Han Hung. These collaborations have contributed to the successful development of his patents and innovations.
Conclusion
Wei-Cheng Shiu's contributions to photolithography through his patents demonstrate his commitment to innovation and excellence in technology. His work continues to influence the industry and improve imaging quality in lithography applications.