The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2012
Filed:
Jun. 23, 2009
Wei-cheng Shiu, Taoyuan County, TW;
Hai-han Hung, Taoyuan County, TW;
Ya-chih Wang, Taipei County, TW;
Chien-mao Liao, Taipei County, TW;
Shing-yih Shih, Taipei County, TW;
Wei-Cheng Shiu, Taoyuan County, TW;
Hai-Han Hung, Taoyuan County, TW;
Ya-Chih Wang, Taipei County, TW;
Chien-Mao Liao, Taipei County, TW;
Shing-Yih Shih, Taipei County, TW;
Nanya Technology Corporation, Taoyuan, TW;
Abstract
A patterning method has a mask layer and undoped patterns sequentially formed on a target layer. A doping process is performed to surfaces of the undoped patterns to form doped patterns from the surfaces of the undoped patterns. A material is filled in the gaps between the doped patterns. A portion of the doped patterns are then removed to expose the top surfaces of the remaining undoped patterns. The material and the exposed undoped patterns are removed. A portion of the mask layer is removed using the remaining doped patterns as a mask to form a first pattern on the mask layer. A portion of the target layer is removed using the mask layer having the first pattern thereon as a mask so as to form on the target layer a second pattern complementary to the first pattern.