The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2012
Filed:
Nov. 27, 2008
Applicant:
Wei-cheng Shiu, Taoyuan County, TW;
Inventor:
Wei-Cheng Shiu, Taoyuan County, TW;
Assignee:
Nanya Technology Corp., Kueishan, Tao-Yuan Hsien, TW;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/72 (2006.01); G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithography apparatus includes: a light source comprising a first light beam and a second light beam, a photomask, a polarization controlling system positioned between the light source and the photomask, a wafer state for holding a wafer, and a lens positioned between the photomask and the wafer stage. The polarization controlling system diverts the first light beam into a first polarization direction and diverts the second light beam into a second polarization direction, wherein the first polarization direction and the second polarization direction are different from each other.